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DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics


DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics (EPIDIF)

General information
Name:DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics
Abbreviation:EPIDIF
Website:
Phone:
Fax:
e-Mail:lfokin@mail.ru
Comments:Diffusion coefficients for components of the CVD processes in microelectronics.

Keywords
diffusion, intermolecular potential, semiconducting

Developers
CountryNameAddress
RussiaJoint Institute for High Temperatures of RAS (ОИВТ РАН)Izhorskaya 13/19, Moscow, 125412, Russia

Literature References
AuthorsNameSourceYearVolumeNumberPages
1Fokin L.,
Kalashnikov A.,
Petkov I.,
Pirgov P.,
Popov V.,
Zarkova L.
Joint Russian and Bulgarian Academies of Sciences Database of intermolecular potentials and diffusion coefficients for components of the CVD processes in microelectronics
View PDF
Int.J.Thermophysics20012251497-1506
2Калашников А.Н.,
Фокин Л.Р.
Транспортные свойства смеси разреженных газов N2-H2 в базе данных ЭПИДИФ
View PDF
Теплофиз.высок.температур2009475675-687


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