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DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics
DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics (EPIDIF)
| General information |
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| Name: | DB on Intermolecular Potentials and Diffusion Coefficients for Components of the CVD Processes in Microelectronics |
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| Abbreviation: | EPIDIF |
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| Website: | |
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| e-Mail: | lfokin@mail.ru |
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| Comments: | Diffusion coefficients for components of the CVD processes in microelectronics. |
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| Status: | not active |
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| Keywords |
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| diffusion, intermolecular potential, semiconducting |
| Developers |
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| Country | Name | Address |
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| Russia | Joint Institute for High Temperatures of RAS (JIHT RAS) | Izhorskaya 13/19, Moscow, 125412, Russia |
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| Literature References |
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| № | Authors | Name | Source | Year | Volume | Number | Pages |
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| 1 | Fokin L.,
Kalashnikov A.,
Petkov I.,
Pirgov P.,
Popov V.,
Zarkova L. | Joint Russian and Bulgarian Academies of Sciences Database of intermolecular potentials and diffusion coefficients for components of the CVD processes in microelectronics
 | Int.J.Thermophysics | 2001 | 22 | 5 | 1497-1506 |
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| 2 | Калашников А.Н.,
Фокин Л.Р. | Транспортные свойства смеси разреженных газов N2-H2 в базе данных ЭПИДИФ
| Теплофиз.высок.температур | 2009 | 47 | 5 | 675-687 |
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